News Article
ASM ships Levitor
ASM International has shipped a Levitor 4000 rapid thermal processing (RTP) system for 200mm wafers to a "leading device maker in Europe". The European customer will use the tool to develop implant anneals for 90nm processing and NiSi annealing applications in the 200-550C temperature range for future technology nodes.
ASM International has shipped a Levitor 4000 rapid thermal processing (RTP) system for 200mm wafers to a "leading device maker in Europe". The European customer will use the tool to develop implant anneals for 90nm processing and NiSi annealing applications in the 200-550C temperature range for future technology nodes.
"Levitor satisfies the requirements depicted in the ITRS roadmap for critical processes from the present technology node down to the 45nm," says Ernst Granneman, ASM's Levitor business unit manager. "This includes state-of-the-art arsenic and boron-based ultra shallow junctions as well as CoSi2 and NiSi formation."
The Levitor 4000 is based on a floating wafer principle where a wafer is confined between two massive hot blocks that heat it by conduction. The gas layer between the wafer surface and reactor blocks self-centres the wafer and keeps it floating without any support. The 0.15mm thick gas layer enables uniform, ultra fast heating with rates up to 900C/s.
Traditional RTP tools use lamps and susceptors.
