ASML sells first immersion scanner
The tool combines the improved depth of focus of immersion tools with the precision of dry lithography systems. The dual-stage design of Twinscan allows wafer measurement – including focus and overlay – to be completed in the dry stage (the metrology station). The imaging process uses an immersion fluid applied between the wafer and the lens (the exposure station). Similar lenses are used to dry lithography with only slight modifications required.
Doug Dunn, company president and CEO, comments: "Our customers and the market have long debated the benefits of 157nm vs. immersion technologies. With the introduction of the XT:1250i, ASML has committed itself to be the only company that delivers both."
The XT:1250i is the immersion version of ASML's recently announced TWINSCAN XT:1250. Both systems operate at the 65nm node with half-pitch resolution at 70nm. The XT:1250 is geared for advanced production, while the XT:1250i will allows customers to test and qualify immersion processes.
No financial details of the TSMC sale are being disclosed. "We are pleased that TSMC selected ASML's TWINSCAN systems to enable their immersion technology program," says Dunn.
