CPL mask link-up
CPL has the potential to extend the lifecycle of current 193nm lithography processes to the 90nm and 65nm nodes and can be broadly applied to logic and memory devices for critical gate and contact layers.
Adoption of CPL technology requires the availability of three critical components: leading edge software, advanced imaging systems and high-end photomasks.
ASML MaskTools will deliver the software component through its LithoCruiser (CPL imaging simulation) and MaskWeaver (full-chip CPL mask data conversion) products. ASML will deliver the imaging components through its KrF and ArF Twinscan platform including the recently announced XT:1250 scanner. Photronics will deliver the mask component through the delivery of CPL masks.
As part of the agreement, Photronics will work with ASML to help develop a seamless CPL manufacturing flow for Photronics’ mask making process. In turn, ASML will provide Photronics with an R&D license for CPL technology patents encompassing the mask making, wafer imaging and software implementation domains. In addition, each side will promote each other’s CPL products and services to their common customer base.
