News Article
Leti buys Rudolph metrology
France’s CEA-Leti Advanced R&D Centre has bought a Rudolph Technologies S300-ultra metrology system. The tool will be used on the Nanotec 300 programme - a consortium involving STMicroelectronics, Philips and Motorola. Nanotec 300 focuses on developing 300mm processes that will transfer to production at 45nm. Nanotec 300 will use the S300-ultra for measuring the ultra-thin transparent films required for advanced gates including thin oxides and high-k dielectrics.
France’s CEA-Leti Advanced R&D Centre has bought a Rudolph Technologies S300-ultra metrology system. The tool will be used on the Nanotec 300 programme - a consortium involving STMicroelectronics, Philips and Motorola. Nanotec 300 focuses on developing 300mm processes that will transfer to production at 45nm. Nanotec 300 will use the S300-ultra for measuring the ultra-thin transparent films required for advanced gates including thin oxides and high-k dielectrics.
S-series systems combine laser ellipsometry and photomultiplier-DUV reflectometry for characterisation of rapidly changing gate stack processes. Capabilities include measurement of the thickness and nitrogen concentration of sub-20Angstrom nitrided gate oxides, as well as the HfO2 and HfSixOx high-k dielectric materials due to be introduced at the 45nm technology node.
