News Article
Nikon presses on with EUV
Nikon says that it sees no major hurdles blocking the development of extreme ultraviolet lithography (EUVL) systems. The company plans to start full-scale product development in 2004. A system is due for launch by 2006. The tool will be targeted at mass production of 45nm DRAMs and 32nm microprocessors.
Nikon says that it sees no major hurdles blocking the development of extreme ultraviolet lithography (EUVL) systems. The company plans to start full-scale product development in 2004. A system is due for launch by 2006. The tool will be targeted at mass production of 45nm DRAMs and 32nm microprocessors.
EUVL systems will need development of a light source capable of providing enough light at the 13.5nm wavelength, extremely precise mirrors, a high quality projection system and an EUV wave measurement system.
Nikon has been conducting basic research for more than 10 years and has been a member of the Extreme Ultraviolet Lithography System Development Association (EUVA) since it was established in June 2002. In January 2003, Nikon established a new EUVL development department within its Precision Equipment company.
The EUVA was formed from nine EUV related companies under the auspices of the Japanese Ministry of Economy, Trade and Industry (METI) and the New Energy and Industrial Technology Development Organisation (NEDO).
