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News Article

Micronic abandons first generation photomask system

Micronic Laser Systems has decided to discontinue the Sigma7100, which will be replaced by Sigma7300. The Sigma7000 series uses an array of micromirrors to produce images in parallel, promising higher throughput. The mirror system was developed with the Fraunhofer Institute for Microelectronic Circuits and Systems (IMS).
Micronic Laser Systems has decided to discontinue the Sigma7100, which will be replaced by Sigma7300. The Sigma7000 series uses an array of micromirrors to produce images in parallel, promising higher throughput. The mirror system was developed with the Fraunhofer Institute for Microelectronic Circuits and Systems (IMS).

Two Sigma7100 systems were ordered in 2002. One was shipped to DuPont Photomasks (DPI). After extensive negotiations concerning production performance, the parties reached an agreement where DPI will return the system to Micronic. The customer for the other system postponed delivery due to the market situation. The order has now been removed from Micronic’s order backlog.

It is Micronic’s intention to rebuild both systems for future sales. The total cost including rebuilding, write down of accounts receivables and inventory amounts to SEK107.5mn.

Sven Loefquist, Micronic president and CEO, comments: "The fact is that the Sigma7100 reached the market at the worst moment. The semiconductor industry has never experienced such a deep downturn as during the period 2001-2003. It is then natural that our industry, facing low volumes and severe price pressure not just focus on lithographic performance but also all production related aspects ultimately affecting the cost of ownership. The Sigma7100, being the first generation of a brand new technology did unfortunately not meet the requirements for production stability. With this decision we have put the Sigma7100 behind us."

He adds: "The Sigma7300 has demonstrated top performance well in line with the market needs for advanced mask writers aimed at volume production of photomasks down to the 65nm node."

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