News Article
Sony/Toshiba develop 45nm
Sony and Toshiba are to collaborate in the development of 45nm process and design technologies for next-generation system large-scale integration (LSI). This extends the companies’ successful development of 65nm process technologies to the next level. Positive 45nm results are expected in 2005.
Sony and Toshiba are to collaborate in the development of 45nm process and design technologies for next-generation system large-scale integration (LSI). This extends the companies’ successful development of 65nm process technologies to the next level. Positive 45nm results are expected in 2005.
The 45nm project will have a budget of JPY20bn, to be shared by both companies. Some 150 engineers from the two companies are expected to work on the project at Toshiba's Advanced Microelectronics Centre in Yokohama, Japan, and Oita Operations on Japan’s Kyushu island.
Sony and Toshiba have worked together to pioneer IC process technology since May 2001. The resulting 65nm design process will soon be applied to sample products.
