News Article
Immersed in software
SIGMA-C has updated its lithography simulation software for immersion. SOLID-C 6.4 now focuses on technical obstacles that hinder the adoption of immersion lithography. This is achieved by expanding the capability to simulate arbitrary polarisation in source, projector and mask to mitigate the so-called "hyper-NA effects". Radial-, azimuthal- or even completely user-defined polarisation can be analysed.
SIGMA-C has updated its lithography simulation software for immersion. SOLID-C 6.4 now focuses on technical obstacles that hinder the adoption of immersion lithography. This is achieved by expanding the capability to simulate arbitrary polarisation in source, projector and mask to mitigate the so-called "hyper-NA effects". Radial-, azimuthal- or even completely user-defined polarisation can be analysed.
"The most significant barrier for industry-wide adoption of liquid immersion lithography is the fear of the unknown," says Ulrich Hofmann, director of technical marketing at SIGMA-C. "Solid-C 6.4 provides the opportunity to explore immersion lithography to make the right tradeoffs, cutting cycle time and cost."
