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News Article

Lithography system with wet conversion next year

ASML introduced the TWINSCAN XT:1400, a 0.93 numerical aperture (NA), 193nm scanner that images at the 65nm node in volume production environments. The XT:1400 can also be used for pre-production testing and development at the 45nm node. The first shipments are due December 2004.
ASML introduced the TWINSCAN XT:1400, a 0.93 numerical aperture (NA), 193nm scanner that images at the 65nm node in volume production environments. The XT:1400 can also be used for pre-production testing and development at the 45nm node. The first shipments are due December 2004.

The design provides customers with the option of transitioning the system from "dry" to immersion lithography on the fab or factory floor through an 'immersion conversion' kit that is to be made available in Q4 2005. The immersion conversion kit for the XT:1400 will consist of three main components - a lens suitable for immersion use, immersion-compatible wafer stages and immersion infrastructure. The conversion process from a dry to a wet platform would take a matter of weeks.

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