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News Article

Macro and nano integration

Carl Zeiss SMT has integrated the electron beam technology business formerly marketed under the LEO brand into its corporate organisation. The integration of electron beam technology adds to Carl Zeiss SMT’s light optical systems for semiconductor manufacture applications. LEO will become Carl Zeiss SMT’s new Nanotechnology Systems division.
Carl Zeiss SMT has integrated the electron beam technology business formerly marketed under the LEO brand into its corporate organisation. The integration of electron beam technology adds to Carl Zeiss SMT’s light optical systems for semiconductor manufacture applications. LEO will become Carl Zeiss SMT’s new Nanotechnology Systems division.

LEO has been a wholly owned subsidiary of Carl Zeiss SMT since 2001, but the company’s origins can also be traced back to the Carl Zeiss Group over 60 years ago. Among the former LEO products is a photomask repair tool developed in co-operation with NaWoTec. This tool recently won the 2003 German Industry Innovation Award. Carl Zeiss hopes the move will give it access to nanotech growth markets in the USA and Asia - China in particular.

Among its technologies in this area is the new nanoimprint lithography technology. Carl Zeiss SMT AG owns exclusive rights for European distribution of this technology. As a result, it is in a key position to disseminate this technology initially for research, but in the future also for the industrial manufacture of nano structures.

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