E-litho upgrade in Southampton
"The JBX 9300FS installation at Innos is the first unit of its kind in the UK, and will enable the next generations of nano-electronic devices to be produced, also allowing nano-technological research to prosper in the correct environment," explains the senior general sales manager at JEOL UK, Roger Hockham.
The JBX-9300FS features a spot beam with a diameter of 4nm at 100kV, vector scan, and a step and repeat stage. The beam size can be varied widely, with a guaranteed minimum linewidth of less than 20nm. Overlay and stitching accuracies are of comparable dimensions.
Even smaller linewidths down to 10nm have been reported to be possible with this tool," reports Innos CEO Stephen Byars. "Therefore, highly complex patterns with very fine geometries can be written in appropriate e-beam sensitive resists on to wafers with diameters up to 200mm."
The JEOL system is currently in the final stages of installation and commissioning at Innos and acceptance tests are due to be completed by the end of June 2004.
