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News Article

ASM sells CVD and RTP into Japan

ASM International reports that a major Japanese consumer electronics manufacturer has bought its critical process equipment for 300mm/90nm production. Deliveries of ASM's Eagle-12 single-wafer plasma enhanced chemical vapour deposition (CVD) and Levitor 4300 rapid thermal processing (RTP) systems are scheduled to begin in Q4 2004.
ASM International reports that a major Japanese consumer electronics manufacturer has bought its critical process equipment for 300mm/90nm production. Deliveries of ASM's Eagle-12 single-wafer plasma enhanced chemical vapour deposition (CVD) and Levitor 4300 rapid thermal processing (RTP) systems are scheduled to begin in Q4 2004.

The Eagle-12 PECVD tool will be used for multiple process applications, including ASMÕs Aurora low-k dielectric. Aurora is a hard "carbon doped oxide" low-k material that provides resistance to pressure from the chemical mechanical planarisation (CMP) process.

The Levitor RTP system uses a floating wafer principle and two massive hot blocks that heat the substrate through conduction. The gas layer between the wafer surface and reactor blocks self-centres the wafer and keeps it floating without any support. The 0.15mm thick gas enables uniform, ultra fast heating with rates up to 900degreesC/s.

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