Cold electron source from nanotubes
The company is hoping to market its technology through Israel’s MATIMOP industry centre for R&D. Collaboration is sought with semiconductor manufacturing tool, nanotechnology, ionisation device and analytical instrument OEMs in terms of joint ventures and financial support.
The technology uses plasma-enhanced chemical vapour deposition (pe-CVD) to grow multi-wall carbon nanotubes (MWCNTs) singly or in groups. A large variety of substrates can be used and 3D structures can be created.
Single nanotubes can be grown inside a proprietary well structure resulting in a cold field emitter electron source with excellent beam properties. Depending on the application, a suitable number of individual e-beam sources based on these technologies are integrated into a single emitter chip, with individual or global control of extraction voltage and therefore emission current. Array sizes from a single source for a scanning electron microscope (SEM) to 1mn sources for high current sources are possible.
The company sees applications in high-throughout e-beam tools in the semiconductor manufacturing and analytical instrument industries along with replacement of common high-current electron sources in e-beam welding, surface treatment devices, etc.
The developer claims complete intellectual property (IP) ownership. Tasks to be performed include development of customised solutions and commercialisation.
Contact chanan@matimop.org.il
http://www.irc.org.il