SIGMA-C makes Photronics development deal
Photronics is to get preferred partner access to SIGMA-Cs portfolio of lithography simulation software tools along with strategic input on software development objectives that advance the ILP program. Within ILP-related customer engagements, Photronics will deploy SIGMA-C tools to anticipate and understand the implications of the entire photomask process on advanced lithography integration options. In addition, Photronics will also have first access to early releases of new products, including SOLID-E, SIGMA-Cs flagship platform introduced at SEMICON West 2004.
Dr Christopher J Progler, Photronics chief technology officer, comments: "Adoption of immersion lithography and 193nm extensions through the 45nm node will drive a new class of mask interactions in the chip design and lithography imaging processes."
The SOLID-C V6.5 suite offers accelerated mask topography simulation as well as a new, efficient approach to improving wafer topography simulation speed.
