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News Article

New initiative to progress nanoimprint lithography

Austrian semiconductor equipment supplier EV Group has launched a global consortium to develop advanced nanoimprint lithography (NIL) technologies for use in high volume chip production.

NIL is a next-generation lithography method that uses a low-cost, high-resolution and large-area patterning process. It is one of a number of advanced lithography techniques being developed to help achieve the next big reduction in transistor size.

The consortium – known as NIL.Com – is made up of companies and research institutes with expertise in five key areas: templates; resists; processes; equipment; and metrology.

They include the National Research Council of Canada's Industrial Materials Institute, high precision optical products company Leica Microsystems AG and Canadian resist specialist Quantiscript.

"A recent report by Lux Research projected NIL to be the long-term winner among nanolithography platforms, and noted that toolmakers need to work together for our mutual interests," said EV Group chief executive officer Dr Peter Podesser.

"We have assembled critical elements of the entire supply chain. Spanning North America, Europe and Asia, we will leverage NIL synergies and support accelerated market segmentation for key applications.

"With our leading companies and research centres of excellence, we will focus on providing total, high-volume NIL solutions, equipment and processes for chemicals, templates and leading IC manufacturers."
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