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News Article

Applied and IMEC collaborate on 45nm technology

Semiconductor equipment giant Applied Materials and Belgium-based nanotechnology research centre IMEC have launched a joint initiative to develop 45nm-generation transistor-level semiconductor processing technologies.
Semiconductor equipment giant Applied Materials and Belgium-based nanotechnology research centre IMEC have launched a joint initiative to develop 45nm-generation transistor-level semiconductor processing technologies.

The focus of the programme will be critical ultra-shallow junction, gate stack and strain engineering.

Applied Materials contribution to the initiative will include supplying IMEC with state-of-the-art transistor fabrication technologies, including implant, rapid thermal processing, gate stack and chemical vapour deposition systems.

Dr Luc Van den Hove, vice president of silicon process and device technology at IMEC, said:

"We expect this cooperative arrangement to help accelerate our 45nm programmes and push the boundaries of front-end process technology rapidly beyond 45nm to even smaller device nodes."

Dr Randhir Thakur, vice president and general manager of Applied Materials' Front End Products group, said: "Applied is focused on providing manufacturing systems to enable transistor scaling to 45nm and beyond, so it's a natural fit for us to collaborate with IMEC on its leading-edge transistor development."

In addition to this initiative with Applied Materials, IMEC is collaborating with leading chipmakers, including Infineon, STMicroelectronics and Philips, on other programmes to develop advanced semiconductor techniques.
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