News Article
Carl Zeiss microscope achieves record image resolution
German optical equipment maker Carl Zeiss SMT has achieved a record image resolution of 0.8Å (0.08nm) with its latest generation ultra-high-resolution transmission electron microscope (UHRTEM).
German optical equipment maker Carl Zeiss SMT has achieved a record image resolution of 0.8Å (0.08nm) with its latest generation ultra-high-resolution transmission electron microscope (UHRTEM).
The milestone was achieved using a new 200 kV field-emission UHRTEM equipped with electron optical components for aberration correction, electron beam monochromatisation and energy filtered imaging.
Codeveloped by Carl Zeiss and Heidelberg-based CEOS GmbH, the microscope even managed to achieve a resolution of 0.7Å for certain image directions. This nearly equals the theoretically achievable resolution limit. The new microscope has been developed for sub-Angstrom characterisation of advanced materials and device structures, not least atomic scale analysis of transistor gate areas.
In addition to semiconductor industry requirements, artefact-free imaging at utmost resolution will also serve the world's growing nanotechnology community to characterise new devices and materials down to the atomic scale and even below, said Carl Zeiss marketing director Jan Vermeulen.
Dr Udo Nothelfer, vice president of chip giant Advanced Micro Devices Fab 30 in Dresden, is one customer who has already been won over by the new microscope. We are highly impressed by the latest results in high-resolution develop-ment achieved by Carl Zeiss. With its proprietary energy filter technology this tool combines resolution and analytical capabili-ties required for successful process development and control of leading edge IC devices, he said.
The milestone was achieved using a new 200 kV field-emission UHRTEM equipped with electron optical components for aberration correction, electron beam monochromatisation and energy filtered imaging.
Codeveloped by Carl Zeiss and Heidelberg-based CEOS GmbH, the microscope even managed to achieve a resolution of 0.7Å for certain image directions. This nearly equals the theoretically achievable resolution limit. The new microscope has been developed for sub-Angstrom characterisation of advanced materials and device structures, not least atomic scale analysis of transistor gate areas.
In addition to semiconductor industry requirements, artefact-free imaging at utmost resolution will also serve the world's growing nanotechnology community to characterise new devices and materials down to the atomic scale and even below, said Carl Zeiss marketing director Jan Vermeulen.
Dr Udo Nothelfer, vice president of chip giant Advanced Micro Devices Fab 30 in Dresden, is one customer who has already been won over by the new microscope. We are highly impressed by the latest results in high-resolution develop-ment achieved by Carl Zeiss. With its proprietary energy filter technology this tool combines resolution and analytical capabili-ties required for successful process development and control of leading edge IC devices, he said.