Therma-Wave Launches New Metrology Tool
Therma-Wave has launched the Opti-Probe 7341, a thin-film and critical dimension (CD) metrology tool. This latest extension of Therma-Wave’s Opti-Probe line of thin-film measurement tools delivers to semiconductor manufacturers a metrology solution for high-volume 65nm chip production that yields better precision and productivity than earlier generation tools. Comprehensive field data for Therma-Wave’s Opti-Probe-7341 demonstrates an improvement in performance for its customers’ most critical thin-film and optical CD applications by a factor of up to two times.
The improvement in the spectroscopic ellipsometer (SE) performance associated with the Opti-Probe-7341 is of particular benefit to Therma-Wave’s optical CD capabilities, via either Real Time CD (RT/CD) or Tokyo Electron (TEL)/Timbre Optical Digital Profilometry (ODP). The ability to produce accurate and repeatable 2-D and 3-D profile and CD information via non-contact, high productivity techniques is critical for 65 nm production needs.
