News Article
Morgan Advanced Ceramics launches new CMP pad conditioner
Morgan Advanced Ceramics has launched the Diamonex Pheonix Conditioner, which is a new generation of pad conditioner used in the chemical mechanical polishing (CMP) process of wafer fabrication.
Diamonex Pheonix Conditioners are created using a chemical vapour deposited (CVD) diamond film that bonds diamond grit to a silicon or ceramic substrate. The result is an all-diamond surface that is inert to the corrosive CMP slurry chemistries, eliminating the chemical interaction experienced with nickel-plated and sintered conditioners. The molecular diamond bond also minimizes loose diamond grit, avoiding wafer scratches. Available in a range of sizes, the new conditioners have an improved planarity that increases the amount of diamond in contact with the pad being conditioned, thereby improving the surface condition.
