Carl Zeiss achieves record image resolution
Codeveloped by Carl Zeiss and Heidelberg-based CEOS GmbH, the microscope even managed to achieve a resolution of 0.7Å for certain image directions. This nearly equals the theoretically achievable resolution limit. The new microscope has been developed for sub-Angstrom characterisation of advanced materials and device structures, not least atomic scale analysis of transistor gate areas.
"In addition to semiconductor industry requirements, artefact-free imaging at utmost resolution will also serve the world's growing nanotechnology community to characterise new devices and materials down to the atomic scale and even below," said Carl Zeiss marketing director Jan Vermeulen.
Dr Udo Nothelfer, vice president of chip giant Advanced Micro Devices’ Fab 30 in Dresden, is one customer who has already been won over by the new microscope. "We are highly impressed by the latest results in highresolution development achieved by Carl Zeiss.
With its proprietary energy filter technology this tool combines resolution and analytical capabilities required for successful process development and control of leading edge IC devices,” he said.