MEDEA+ launches maskless advisory board
With mask costs rising exponentially at new technology nodes, there is a need to collaborate at the earliest stages to ensure viable lithography options for future technology developments. Presently, several European consortia are in various stages of developing tools for maskless pattern definition. The MEDEA+ advisory board has been labelled EAB-ML2 and will serve as a platform for the exchange of ideas between suppliers and users, and explore application scenarios for the implementation of maskless lithography.
Mart Graef, chair of the EAB-ML2, said: "The expertise and skills that are needed to create maskless lithography tools are available in Europe. The involvement of the major European semiconductor manufacturers and semiconductor equipment companies will ensure that the solutions provided will be tuned to the requirements of the IC industry. This is the most important issue that we will address in the EAB-ML2".
