Sales & orders
Semiconductor cleaning system producer Akrion has ordered 19 chemical blend and delivery modules from BOC Edwards. The systems will be used in Akrion's Goldfinger Mach2HP megasonic wafer cleaning tools at a major Asian fab. The BOC Edwards equipment set has been designed and engineered to complement Akrion's process equipment. The blend and delivery systems will be installed adjacent to the cleaning tools on the process floor, as well as in the sub-fab area, and are designed to handle multiple chemistries. Shipments will commence Q4 2004.
The Albany NanoTech research centre at the University at Albany-State University of New York (SUNY) has ordered Extraction Systems' E3000 filter system to control molecular contamination in one of the world's first 193nm immersion lithography tools.
Devon Kinkead, president of Extraction, comments: "By supporting its immersion lithography programme, we hope to gain additional insights into the mechanics of molecular contamination in immersion lithography processes and ultimately help bring this promising technology into full production."
The E3000 filter system is designed to protect exposure tool optics and resists from a broad range of molecular acids, bases and condensable organics. The system combines contamination control methods for resists with Extraction's next-generation filtration technology for optics, helping preserve illumination uniformity, intensity and lens life.
This is the second time Albany NanoTech has selected Extraction's molecular contamination control technology. Last year, the centre installed Extraction's TMB 150 real-time molecular contamination monitor to support its 157nm lithography systems.
