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The AIX 200FE system will be installed in the clean room facilities of the Institute for Inorganic Chemistry II under the direction of Professor Dr Roland A Fischer and Jr Prof Dr Anjana Devi. The activities of the group are directed at the development of new metal-organic precursors and their properties in different chemical vapour deposition methods.
The Ruhr-University and AIXTRON signed a research and demonstration laboratory agreement wherein both parties will co-operate on the development of metal-organic precursors for high-k and electrode materials and the use of these precursors for an AVD thin film deposition process.
High-k materials are expected to replace silicon dioxide as an isolating gate dielectric, and enable higher transistor performance at drastically reduced leakage currents. At the same time, metal electrode materials are expected to replace poly-silicon as the transistor gate material. STMicroelectronics plans to use GetSilicon's Manufacturing Visibility & Control (MVC) solution to improve outsourced back-end semiconductor manufacturing execution. GetSilicon will provide ST's back-end subcontractors with a user interface to manage supply chain reporting requirements. ST's goal is to further improve data accuracy and also reduce administrative costs associated with data quality. The platform will replace a variety of tools currently in place.
The first phase of the project will enable STMicroelectronics to offer, as an option to its back-end subcontractors, a self-service portal to enter WIP and other transactions. STMicroelectronics plans to use the GetSilicon system for validation of the back-end subcontractors' data and as a stage-gate before feeding its ERP and other planning systems.
