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News Article

Nanotechnology

UK company Applied Microengineering (AML) gave details of its planned use for its recent UK government Department of Trade and Industry (DTI) grant of GBP678,000 to the LOBEL project that will develop a new nano device production tool for micro polymer embossing and nano-imprint lithography (NIL) and surface activation for low-temperature wafer bonding (Bulletin 551, September 15, 2004).
UK company Applied Microengineering (AML) gave details of its planned use for its recent UK government Department of Trade and Industry (DTI) grant of GBP678,000 to the LOBEL project that will develop a new nano device production tool for micro polymer embossing and nano-imprint lithography (NIL) and surface activation for low-temperature wafer bonding (Bulletin 551, September 15, 2004).

The new processes will be designed for use on AML's in-situ aligner-bonder platform. NIL will require an exceptional degree of mechanical stability and precision at elevated temperatures and surface activation needs the controlled exposure of the wafer to energetic ions. The project will develop a proof-of-concept machine. Imperial College London and the Open University Research Unit, as well as engineering company Cranfield Precision, will be partners in the project.

Oak Ridge US national laboratory scientists have used electron microscope aberration correction technology from Nion to directly image silicon at sub-Angstrom resolutions (Science, September 17, 2004). The transmission electron microscope (TEM) was able to image silicon crystal in the <112> orientation, showing the dumbbell spacing of Si column pairs of 0.78Angstoms (78pm) using a 300 kV VG Microscopes HB603U scanning TEM (STEM). Analysis of the power spectrum shows the presence of information down to 0.61Angstroms. The imaging mode used was annular dark-field (ADF). Before correction, the optimum ADF resolution limit on the microscope used was 0.13nm.

"We expect light columns to be visible in the presence of adjacent heavy columns and individual dopant or impurity atoms to be detectable within materials, at defects and interfaces, and on their surfaces," the authors write.

Although the wavelength of the electrons used in TEM imaging can be of the order of a few picometres (0.001nm), spherical aberration limits resolution to about 0.15nm. Nion's technology uses arrangements of magnetic lenses designed by to computer to provide aberration correction. The company works with many research organisations. In Bulletin 445, August 12, 2002, we reported work with scientists at IBM imaging gold atoms on a carbon substrate.

Nearly 90% of US citizens believe that continued US global leadership in technology is important to its economy, according to an online survey of 400 respondents conducted by GolinHarris. Further, more than 76% believe that funding for research into the new fields of nanoscience and nanotechnology should be a priority of both federal and state governments. Some 60% said the government should increase current funding levels for nanotechnology research. Unfortunately the research author failed to highlight where the 400 apparently self-selecting individuals came from.

Most global regions are looking at how they position themselves for future opportunities. In addition to traditional research, there is an increasing need for governments, industry and education institutions to work together. Since nanotechnology is the current technology buzzword, industry has been able to encourage higher government involvement world wide.

The US 2003-2004 budget for spending on nanotechnology research is $900mn per year. In 2002, spending outside the USA was twice what the US government spent on nanotechnology research during the same year. The GolinHarris report author feels that the US companies and the federal government are not keeping pace despite this being a comparison between the USA and the rest of the world.

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