News Article
Gale heads up SEZ's FEOL programme
Austrian wafer cleaning group SEZ has appointed Glenn Gale as vice president of the company's front-end-of-line (FEOL) cleaning programme.
Austrian wafer cleaning group SEZ has appointed Glenn Gale as vice president of the companys front-end-of-line (FEOL) cleaning programme.
In this role, Gale will manage SEZ's worldwide FEOL cleaning processes, oversee the introduction and implementation of the company's FEOL cleaning solutions and focus on development of cleaning technology for the 65nm and 45nm nodes.
An international expert in semiconductor surface-preparation and cleaning technologies, Gale previously served as chief technologist for the cleaning systems business unit of Tokyo Electron America.
Prior to this, he served as a project manager for surface preparation in the front-end processes division of International SEMATECH.
Gale also played an integral role in the development of the surface preparation section of the International Technology Roadmap for Semiconductors (ITRS).
Gale holds a bachelor's and a master's degree in mechanical and industrial engineering, and a doctorate in mechanical and aeronautical engineering, with a minor in chemistry, from Clarkson University, New York.
"To consistently provide our global customer base with leading-edge cleaning solutions, SEZ recognises that we must make sure our team comprises the world's leading experts within the surface preparation industry," said Kurt Lackenbucher, chief operations officer and executive vice president for the SEZ Group.
"Glenn's extensive accomplishments within this industry and his renowned global reputation make him ideally suited to drive SEZ's single-wafer FEOL cleaning strategy."
In this role, Gale will manage SEZ's worldwide FEOL cleaning processes, oversee the introduction and implementation of the company's FEOL cleaning solutions and focus on development of cleaning technology for the 65nm and 45nm nodes.
An international expert in semiconductor surface-preparation and cleaning technologies, Gale previously served as chief technologist for the cleaning systems business unit of Tokyo Electron America.
Prior to this, he served as a project manager for surface preparation in the front-end processes division of International SEMATECH.
Gale also played an integral role in the development of the surface preparation section of the International Technology Roadmap for Semiconductors (ITRS).
Gale holds a bachelor's and a master's degree in mechanical and industrial engineering, and a doctorate in mechanical and aeronautical engineering, with a minor in chemistry, from Clarkson University, New York.
"To consistently provide our global customer base with leading-edge cleaning solutions, SEZ recognises that we must make sure our team comprises the world's leading experts within the surface preparation industry," said Kurt Lackenbucher, chief operations officer and executive vice president for the SEZ Group.
"Glenn's extensive accomplishments within this industry and his renowned global reputation make him ideally suited to drive SEZ's single-wafer FEOL cleaning strategy."
