News Article
TSMC and Carl Zeiss SMT push repair technology for advanced photomasks
Semiconductor Metrology Systems Division (SMS) of Carl Zeiss SMT, Germany, today announced that TSMC has decided to purchase the new Carl Zeiss SMT multi-generation e-beam mask repair system MeRiT™ MG.
Semiconductor Metrology Systems Division (SMS) of Carl Zeiss SMT, Germany, today announced that TSMC has decided to purchase the new Carl Zeiss SMT multi-generation e-beam mask repair system MeRiT™ MG. The system will be deployed for repair of sophisticated photomasks at TSMC´s high-end mask production facility in HsinChu, Taiwan. The system is part of the new product portfolio for next genera-tion photomask qualification and repair solutions aiming at semiconduc-tor technology nodes at or beyond 65nm.
Electron-beam-based mask repair is a paradigm shifting technology that will enable mask makers to guarantee the performance of future pho-tomasks regardless of the mask types, such as phase shifting and bi-nary intensity masks with sub-resolution assist features. “The transition to sub-90nm chips will make the shift to electron beam-based-mask repair highly desirable for all advanced mask makers,” according to TSMC’s Dr. Burn Lin, Senior Director at Micro Patterning Technology Division.
The MeRiT™ E-beam mask repair system is based on the extremely successful and field proven ZEISS electron optical platform and the outstanding process development of Carl Zeiss SMT´s subsidiary Na-WoTec in Rossdorf, Germany. With the patented GEMINI® e-beam column design the MeRiT™ system reduces the charging of pho-tomasks that has previously been prohibitive in all attempts to introduce electron-beam based mask repair. At the same time, the ultra-high resolution of the GEMINI® column provides the industry with the highest fidelity repair & imaging capabilities. “Our cooperation with TSMC is an excellent example of how our industry can sustain its positive growth and stay on the roadmap despite the various technological challenges,” said Dr. Oliver Kienzle, Member of the Carl Zeiss SMS Board. He added: “Only such an advanced customer can provide the development teams with insight into the technological requirements of high-end ap-plications which are essential for the success of such a challenging project.”
The MeRiT™ system will be installed in July 2005 in TSMC and is ex-pected to support 65nm and future 45nm generation photomask manu-facturing.
As announced on 1st of June 2005, Carl Zeiss SMT has acquired Na-WoTec GmbH, Rossdorf. The start-up company is a spin-off from Deutsche Telekom AG with a highly skilled workforce of over 30 em-ployees. Unique expertise in nano-lithography and numerous interna-tional patents are the basis for successful applications in electronics, nano-analytics, bio-nano physics and microoptics.
Contact for the press
Markus Wiederspahn
Carl Zeiss SMT AG
73446 Oberkochen, Germany
Phone: +49 7364 20-2194
Fax: +49 7364 20-4970
Email: wiederspahn@smt.zeiss.com
Electron-beam-based mask repair is a paradigm shifting technology that will enable mask makers to guarantee the performance of future pho-tomasks regardless of the mask types, such as phase shifting and bi-nary intensity masks with sub-resolution assist features. “The transition to sub-90nm chips will make the shift to electron beam-based-mask repair highly desirable for all advanced mask makers,” according to TSMC’s Dr. Burn Lin, Senior Director at Micro Patterning Technology Division.
The MeRiT™ E-beam mask repair system is based on the extremely successful and field proven ZEISS electron optical platform and the outstanding process development of Carl Zeiss SMT´s subsidiary Na-WoTec in Rossdorf, Germany. With the patented GEMINI® e-beam column design the MeRiT™ system reduces the charging of pho-tomasks that has previously been prohibitive in all attempts to introduce electron-beam based mask repair. At the same time, the ultra-high resolution of the GEMINI® column provides the industry with the highest fidelity repair & imaging capabilities. “Our cooperation with TSMC is an excellent example of how our industry can sustain its positive growth and stay on the roadmap despite the various technological challenges,” said Dr. Oliver Kienzle, Member of the Carl Zeiss SMS Board. He added: “Only such an advanced customer can provide the development teams with insight into the technological requirements of high-end ap-plications which are essential for the success of such a challenging project.”
The MeRiT™ system will be installed in July 2005 in TSMC and is ex-pected to support 65nm and future 45nm generation photomask manu-facturing.
As announced on 1st of June 2005, Carl Zeiss SMT has acquired Na-WoTec GmbH, Rossdorf. The start-up company is a spin-off from Deutsche Telekom AG with a highly skilled workforce of over 30 em-ployees. Unique expertise in nano-lithography and numerous interna-tional patents are the basis for successful applications in electronics, nano-analytics, bio-nano physics and microoptics.
Contact for the press
Markus Wiederspahn
Carl Zeiss SMT AG
73446 Oberkochen, Germany
Phone: +49 7364 20-2194
Fax: +49 7364 20-4970
Email: wiederspahn@smt.zeiss.com
