SEMI publishes MEMS standards
SEMI has published eight new technical standards applicable to the semiconductor, flat panel display (FPD) and MEMS manufacturing industries. The new standards, developed by technical experts from equipment suppliers, device manufacturers and other companies participating in the SEMI International Standards Program, are available for purchase in CD-ROM format or can be downloaded from the SEMI website, www.semi.org.
The standards include specifications for epitaxial silicon wafers, test methods for measuring mechanical vibrations in FPD handling equipment, MEMS terminologies, and data matrix symbology for automated identification of EUV lithography masks.
“These new specifications will help semiconductor, FPD and MEMS manufacturers reduce production costs and speed time-to-market,” said Bettina Weiss, SEMI director of International Standards. “SEMI is particularly pleased to be able to offer the first set of standard terminologies applicable to the MEMS market.”
The new standards released today include:
D43-1105
Test Method for Mechanical Vibration in AMHS
E142.3-1105
Specification for Web Services for Substrate Mapping
F101-1105
Test Methods for Pressure Regulators used in Gas Distribution Systems
M62-1105
Specifications for Silicon Epitaxial Wafers
P44-1105
Specification for Open Artwork System Interchange Standard (OASIS(TM)) Specific to VSB Mask Writers
PR10-1105
Proposed Specification for RF Air Interface between RFID Tags in Carriers and RFID Readers in Semiconductor Production and Material Handling Equipment
PR11-1105
Terminology for MEMS
T16-1105
Standard for use of Data Matrix symbology for automated identification of Extreme Ultraviolet lithography masks
