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Agreement signed for technology support & Development

Toppan Photomasks, Inc. and Cypress Semiconductor Corp. announced an agreement to jointly develop advanced photomask technology supporting the production of high-performance integrated circuits at 65nm design rules and below.

Toppan Photomasks, Inc. and Cypress Semiconductor Corp. announced an agreement to jointly develop advanced photomask technology supporting the production of high-performance integrated circuits at 65nm design rules and below.

Both companies have also entered into a separate three-year supply agreement in which Cypress has named Toppan Photomasks as its strategic supplier of commercial photomasks. As part of this supply agreement, Toppan Photomasks will provide Cypress with a majority of photomask requirements for commercial production during the next three years. Both the joint development project (JDP) and the strategic supplier agreement are extensions of contracts each company signed in 2002.

"Building on our existing JDP with a leading global device manufacturer like Cypress underscores the value each partnership holds in improving yields and accelerating technology," said Jim Northup, chief operating officer, Toppan Photomasks.

The agreement extension with Cypress is among Toppan's growing list of advanced development collaborations with leading semiconductor manufacturers for customized photomask technology. In addition to Cypress, Toppan maintains collaborations with AMD and Infineon Technologies, among others.

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