LSI tech partnerihip for 45-nanometer generation
NEC Electronics Corporation, Sony Corporation, and Toshiba Corporation announce the agreement to jointly develop system LSI process technologies for the 45-nanometer (nm) generation.
With applications in the digital consumer, mobile, and communications areas evolving so rapidly, there are greater requirements for advanced system LSI technologies to achieve higher performance and functionality, such as high-speed data processing, as well as lower power consumption and smaller chip dimensions. The miniaturisation of process technology to meet these requirements is becoming increasingly critical and complex.
Meeting these requirements for leading edge system LSI process technology development requires a tremendous investment of development resources. Many semiconductor companies worldwide are working together with the goal of more efficient development.
In February 2004, Sony and Toshiba announced their collaboration on 45-nm system LSI process technology development, and have since proceeded with technology development based at Toshiba's Advanced Microelectronics Centre in Yokohama, Japan. The results of their efforts have been reported and recognised at industry symposia. Likewise, NEC Electronics and Toshiba announced their agreement to jointly develop 45-nm process technology in November 2005, and have been in discussions to decide the details of that collaboration.
As a result of the agreement, NEC Electronics' 45-nm development team will join Sony and Toshiba's ongoing work on 45-nm technology development at the Advanced Microelectronics Centre. By combining the three companies' development resources, NEC Electronics, Sony, and Toshiba will raise development efficiency and further accelerate the pace of development, with the aim of establishing 45-nm system LSI process technology quickly.
