Unaxis unveils production solution enabling 45nm
Unaxis Wafer Processing, have announced their latest technology allowing device manufacturers to descend to the 45nm technology node and beyond. The latest process innovations demonstrate sub-3nm CD uniformity in Cr etch and 2 degree phase uniformity for advanced Quartz mask - enabling the manufacture of 45nm photomasks.
With the semiconductor industry technology roadmap (ITRS) continuing to contract, the design of the mask etching tool demonstrates micro-lithography and ultra-high resolution mask making are key success factors for the future of semiconductors. The Unaxis platform provides enhanced ICP process solutions over previous systems, including improved particle control, ultra-low CD etch bias and sub-7nm feature-size linearity.
"Unaxis is one of the companies leading the charge to 45 nm and below in this nano era.",stated Dr. Peter Podesser, President of Unaxis Wafer Processing. "
