News Article
AMO GmbH installs nanoimprint lithography system
AMO GmbH (AMO), a German research foundry in nanoelectronics, added a new highlight to its nanostructuring equipment.
Within a joint development program of EVGroup and AMO an automated step&repeat UVbased Nanoimprint Lithogaphy (UV-NIL) system, the EVG770 NILStepper, has been developed, manufactured and installed at AMO.
UV-NIL is a next-generation lithography technology technique that could potentially proceed optical lithography for the 32-nm node, according to the International Technology Roadmap of Semiconductor (ITRS). AMO is working on UV-NIL for performing R&D and small scale production for applications in the area of photonic devices, nanoelectronics, and life sciences.
