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News Article

MP Mask technology centre formation

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Photronics Inc. and Micron Technology Inc. announced the formation of a joint venture known as MP Mask Technology Centre LLC ("MP Mask").

Photronics Inc. and Micron Technology Inc. announced the formation of a joint venture known as MP Mask Technology Centre LLC ("MP Mask"). The joint venture will develop and produce photomasks for leading-edge and advanced next-generation semiconductors and will begin supplying these photomasks immediately. As part of the formation of the joint venture, Photronics will be investing $135 million over a three year period while Micron contributed its existing photomask technology centre located at its headquarters in Boise, Idaho, to MP Mask. In connection with the joint venture, Micron and Photronics have entered into a technology license agreement and certain supply agreements.

Complementing the investment each company is making in MP Mask, Micron and Photronics intend to build an independent state-of-the-art NanoFab in Boise that will be operated by Photronics for volume production of advanced technology photomasks. Photronics' investment in this facility is expected to fall within a range of $100 million to $150 million and will include new capital in addition to redeployed assets. The new facility is planned to implement the technology developed inside MP Mask to create the industry's most advanced photomask supply source, and will manufacture products for the most advanced applications for Micron and other Photronics customers. This new facility is expected to be completed and to begin qualification by the end of 2007.

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