News Article
PDF Solutions Helps Infineon Technologies
PDF Solutions, Inc. announced that under an engagement that began last year, Infineon Technologies has been implementing PDF Solutions' 90 nanometer (nm) Characterisation Vehicle(R) (CV(R)) infrastructure at its advanced logic fab in Dresden.
The project, a collaborative effort by engineering teams from PDF and Infineon, includes deployment of PDF's CV infrastructure (CVi) to accelerate the ramp of Infineon's 90nm CMOS process and follows their joint success at 130nm. "PDF Solutions worked with our engineers to significantly accelerate our yield learning at 130nm and our engineers continue to benefit from the on-going use of PDF's methodology and tools for continuous yield optimisation at that node. Our current 90nm project with PDF has shown further significant improvement in yield ramp speed. said Mr. Christian Esser, Vice President Technology, Infineon Dresden." "Semiconductor companies face a growing challenge," said Dr. Andrzej Strojwas, Chief Technologist at PDF Solutions. "Shorter product life cycles require faster ramps but shrinking feature sizes and the introduction of new materials have led to a significant increase in ramp complexity." Added Dr. Strojwas, "Traditional yield improvement methods are losing their efficiency and result in sub-optimal allocation of ramp resources and budgets. PDF Solutions has spent the last 10 years developing new methods and tools to support faster ramps."
