AIXTRON receives first China silicon order
AIXTRON AG has received their first order for its 300 mm silicon CVD LYNX3 system, which will be installed in a recently built memory fab located in Jiangsu Province, P.R. China. This order allows AIXTRON to expand its technology further into the growing Chinese DRAM sub-90nm high-volume production space.
This order demonstrates how AIXTRON is benefiting from its customer’s expansion into Mainland China, as it is a direct result of the successful long-term partnership on memory and capacitor 300 mm processes at the customer’s high-volume production fab in Korea.
The Genus brand tungsten silicide films are principally used for advanced memory applications and provide customers with many advantages, including stable performance characteristics during exposure to high-temperature deposition steps.
Dr. William W.R. Elder, the Member of AIXTRON’s Executive Board responsible for all of AIXTRON’s silicon business interest comments: “In addition to ALD and AVD technologies, Genus’ core tungsten silicide CVD platform makes up a comprehensive range of semiconductor platform technologies the group can offer to customers. Genus’ CVD and ALD tools offer the same common platform and system design, simplifying operations and service, a key aspect of the extension of advanced semiconductor process equipment and low cost of ownership.”
China remains one of the most important strategic opportunities for all AIXTRON Group technologies.
