News Article
Veeco receives order for new PVD tool
Veeco Instruments Inc. announced that it received an order during the second quarter of 2006 for its new NEXUS Physical Vapor Deposition (PVD) Multi-Target Sensor tool from a leading manufacturer of thin film magnetic heads. Veeco's NEXUS PVD multi-target system is used to deposit high-quality, extremely uniform, thin film multi-layer stacks and will be used by the customer to manufacture high areal density Tunneling Magneto-Resistive (TMR) heads.
Robert P. Oates, Senior Vice President, Veeco Process Equipment, commented, "Veeco has designed our NEXUS product line to be a turn-key solution for our thin film magnetic head customers' front-end wafer process. The NEXUS-PVD multi-target system is part of Veeco's expanded PVD/ALD product line which respond to the industry's move to high areal density perpendicular recording technology."
Key technical features of the NEXUS PVD Multi-Target include its in-situ ion source for surface modification and oxidation, nano-lamination for complex alloy formation and velocity profiling for superior film uniformity. It can be integrated on a common platform with technologies such as ion beam deposition, ion beam etch and atomic layer deposition.
