News Article
Cadence, Magma, and Extreme DA Collaborate
Cadence Design Systems, Magma Design Automation Inc. and Extreme DA, with support from ARM, Virage Logic Corporation, and Altos Design Automation, announced their collaboration to accelerate the creation of a standard statistical analysis library format under the Open Modeling Coalition of Si2. This open statistical library format will be based on current source models. In addition to enabling interoperability between design tools and methodologies for 65-nanometer (nm) design and below, the intent is to create a comprehensive solution that will eliminate the need for designers to support multiple library formats -- a time-consuming and costly undertaking that introduces errors into the design process and delays the delivery of complex integrated circuits (ICs).
"Si2 welcomes the collaboration of these industry leaders in producing an open, industry-managed format to enable statistical analysis of design variability. Choosing to do so within the Open Modeling Coalition underscores the importance of Si2's efforts to the industry," said Steve Schulz, president and CEO, Si2.
Statistical analysis is necessary to enable designers to more efficiently manage the increasing process variations in manufacturing and sensitivity to operating-environment parameters that affect circuit performance at 65-nm and below. Standardization of the information required to support this analysis is key to rapid industry adoption. The format being developed by the companies will be contributed to the Open Modeling Coalition in response to Si2's request for technology (RFT). This contribution will be considered for standardization in the OMC for a statistical static library format. All members of the OMC in good standing will share an equal voice in guiding the evolution of the format.
"Managing electrical analysis and variability is a significant challenge our customers face, and is an area of emphasis and focus for Cadence," said James Miller Jr., executive vice president, Products and Technologies Organization at Cadence. "Current source models are required to characterize these effects at 65-nanometers and below, and since 1999, ECSM has been in production use and the industry choice for advanced delay calculation, extensible to timing, power, and signal integrity. Statistical analysis is the next logical progression for ECSM, and we are pleased to collaborate with industry leaders on a common single source statistical format to enable customers to effectively manage the increasing complexities of nanometer design."
"Magma is dedicated to providing its customers with a flexible, seamless design environment that eliminates artificial barriers that inhibit innovation," said Suk Lee, general manager of Magma's Custom Design Business Unit. "We're pleased to be working on a statistical-library format standard because we believe it will make it easier for our customers to address the challenges of process variation at the 65-nm node and below."
According to Mustafa Celik, CEO of Extreme DA, "Extreme DA has deep experience gained by working with top integrated device manufactures (IDMs). We have been an active participant in Si2's Open Modeling Coalition and look forward to contributing our knowledge to the development of this important standard. Having a concerted industry effort to develop a single open format to address statistical variation will enable us to better address our customer's design challenges."
"As an early member of the Open Modeling Coalition, Virage Logic has assumed a leadership position in the Statistical Working Group and we firmly believe in the need for open industry-wide collaboration. Establishing a common format for describing statistical information will further enhance Virage Logic's IP robustness with respect to design variability," said Jim Ensell, senior vice president of Marketing and Business Development at Virage Logic.
"We look to Si2 and OMC to develop standards in cooperation with representatives from the EDA and user companies to support statistical timing and other analysis for chip design," said Uday Kapoor, Director of Corporate CAD at Sun Microsystems, Inc. "Contributions from these companies can serve as an essential catalyst in achieving these goals."
"ARM is committed to working for the establishment of open industry standards which enable us to improve support for our customers' flows," said John Goodenough, director of Design Technology, ARM. "Establishing a common library format to support the statistical analysis tools used in SoC integration flows will be a key driver in helping our customers achieve their design goals while managing the variability of today's manufacturing processes."
