Mask solution technology from Carl Zeiss SMT
"AMTC is another leading mask shop benefiting from our unique E-beam based mask repair technology", points out Frank P. Averdung, Managing Director of SMS division from Carl Zeiss SMT. The MeRiT tools have started to be deployed successfully in high-end mask shops throughout the industry, the next one will be shipped this month to a major captive mask shop. "We have decided for an E-beam mask repair system from SMT because of its outstanding repair capability and accuracy for structures down to 65nm. In addition, we already have had successful experiences with the AIMS mask inspection system from Carl Zeiss SMT over the last years. Now, in combination with the MeRiT mask repair tool, we expect valuable synergy effects concerning technology, but also in the areas of service, customer focus and costs" says Matthias Peschke, Director of Engineering at AMTC.MeRiT MG is part of Carl Zeiss SMT´s product portfolio for the next generation of photomask qualification and repair solutions, targeting for the semiconductor technology nodes at or beyond 65nm.
Electron-beam-based mask repair is a paradigm shifting technology that will enable mask makers to safeguard the performance of future photomasks regardless of the mask types, such as phase shifting and binary intensity masks with sub-resolution assist features. The MeRiT MG system supports 65nm and future 45nm generation photomask manufacturing as well as early EUV mask development. "With this installation AMTC clearly demonstrates its strong reliance in our mask solutions", SMS Board Member Dr. Oliver Kienzle emphasizes. At the end of 2005 Carl Zeiss SMT already delivered an AIMS fab 193i mask inspection tool to AMTC. This mask inspection tools is able to emulate immersion scanner at the 65nm node. "Our longstanding cooperation with AMTC has always been very fruitful and has been instrumental in guiding our development of solutions for the mask making industry," says Kienzle. He adds: "Finally such cooperation bears fruits for both sides, the tool developer and the end user.
Advanced customers who help defining the path of the development in turn profit from early use of such new technologies."Also in the future AMTC and Carl Zeiss SMT will work together in a close partnership. The latest decision of AMTC to order the AIMS fab 45-193i underlines this development. The AIMS fab 45-193i is the next generation of mask inspection tools that will cover the 45nm node on the lithography roadmap. This system is planned for shipment in autumn 2006. * German Ministry for Education and Research
