Matsushita Selects Mentor Graphics For Manufacturing Nanometer Technology
Mentor Graphics Corporation announced that Semiconductor Company, Matsushita Electric Industrial Co., Ltd. has selected the Calibre OPCverify tool for use in production at 65 nanometers (nm) and below.
Process variability can have a dramatic effect on yield. This is especially true in the lithographic process where variability puts image fidelity at risk even when the operating conditions of the lithographic system (lithographic process window) are acceptable. To reduce the risk of silicon failure, avoid costly respins of both masks and silicon and safeguard time-to-market schedules, Calibre OPCverify detects lithographic errors or marginalities caused by process variability before the design goes to the mask or wafer manufacturer.
"Verification of post-OPC output is critical to minimizing mask respins of million dollar mask sets, and avoiding time-to-market delays," said Hiroyuki Tsujikawa, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. "Building on the Calibre platform for nanometer technologies has enabled Matsushita to develop a world-class process and gain a competitive advantage in delivering a wide range of System LSI."
"For 90nm and smaller technology nodes, the complexity of OPC and the constraints that go with it require verification to prevent silicon failures," said Joe Sawicki, vice president and general manager for the design-to-silicon division at Mentor Graphics. "Mentor is pleased to have Matsushita join the large and growing ranks of top semiconductor companies who have adopted our production proven verification platform."
AngelTech Live III: Join us on 12 April 2021!
AngelTech Live III will be broadcast on 12 April 2021, 10am BST, rebroadcast on 14 April (10am CTT) and 16 April (10am PST)
and will feature online
versions of the market-leading physical events: CS International
and PIC International
PLUS a brand new Silicon Semiconductor International
Thanks to the great diversity of the semiconductor industry, we are always chasing new markets and developing a range of exciting technologies.
2021 is no different. Over the last few months interest in deep-UV LEDs has rocketed, due to its capability to disinfect and sanitise areas and combat Covid-19. We shall consider a roadmap for this device, along with technologies for boosting its output.
We shall also look at microLEDs, a display with many wonderful attributes, identifying processes for handling the mass transfer of tiny emitters that hold the key to commercialisation of this technology.
We shall also discuss electrification of transportation, underpinned by wide bandgap power electronics and supported by blue lasers that are ideal for processing copper.
Additional areas we will cover include the development of GaN ICs, to improve the reach of power electronics; the great strides that have been made with gallium oxide; and a look at new materials, such as cubic GaN and AlScN.
Having attracted 1500 delegates over the last 2 online summits, the 3rd event promises to be even bigger and better – with 3 interactive sessions over 1 day and will once again prove to be a key event across the semiconductor and photonic integrated circuits calendar.
So make sure you sign up today and discover the latest cutting edge developments across the compound semiconductor and integrated photonics value chain.
REGISTER FOR FREE