Nikon and Synopsys advanced DF lithography collaboration
The Synopsys-Nikon collaboration brings together EDA design and optical lithography imaging system expertise to focus on building next generation "manufacturing-aware" OPC and RET lithography simulation models. At 45 nm and below, critical dimension (CD) control will be at the single nanometre levels pushing current OPC/RET models and optical lithography system performance to the extreme limits.
Early work will focus on the development and optimisation of new advanced lithography simulation models, which can intelligently capture the Nikon lithography system's proprietary signatures. Leveraging the new manufacturing-aware models and the collaborative expertise gained, future work will focus on the development and deployment of advanced DFM manufacturing in-fab solutions for Nikon lithography systems.
"At 45 nanometres and below, the characterisation and integration of both design and manufacturing information is essential," said Anantha Sethuraman, vice president of DFM Solutions at Synopsys. "In this new DFM centric landscape, design companies must work together to accelerate time to entitled yield and reduced time to market."
New lithography simulation and OPC/RET models must be developed to improve CD performance for 45 nm and below. To achieve nanometre level CD control with fast turnaround time, models must be characterised beyond traditional input parameters such as lithography dose, defocus,light source type and lens parameters. New simulation and modelling inputs must include immersion effects, polarisation impacts, global and local flare, wave front aberrations, and other factors that may impactCD performance.
"We believe the accuracy of OPC models can be significantly improved and mask qualification time reduced, by incorporating our unique lithography tool characteristics into the EDA software," stated Toshikazu Umatate,executive officer, Precision Equipment Company, Nikon Corporation. "By partnering with leading-edge EDA companies like Synopsys we can provide enhanced imaging performance for our customers."
