European light source for Japan research
EUV lithography is now the most promising technology for producing semiconductors of 32nmhp and below. The EUVA will use the POWERLASE lasers to develop new EUV sources for lithography steppers, which are to be used in semiconductor chip fabrication research, by generating 13.5nm extreme ultraviolet (EUV) radiation as a source. POWERLASE Starlase lasers has been selected as a research instrument to produce the high power, high-repetition laser, necessary to produce best-in-class results.
Samir Ellwi, POWERLASE Vice President Strategic Innovations concludes; "We are very pleased EUVA has chosen our lasers to fulfil its research needs. We have worked very hard and we will continue to make sure that EUVA future requirements are met. The deal also demonstrates our continued expansion into the Asian market."
The deal follows a recent purchase of AO2/G lasers by the National Institute of Advanced Industrial Science (AIST) in Japan and a distribution agreement with the Japan Laser Corporation, which allows the promotion of the entire AO Starlase range.