Nanometrics and Nova Measuring Instruments in patent dispute
The patents at issue relate to Nanometrics' optical critical dimension technology, commonly referred to as scatterometry.
"When we merged with Accent Optical, we acquired a number of patents and other fundamental intellectual property in the field of scatterometry, including the patents that are the subject of this new complaint. As a result, we are now in a stronger position to protect our proprietary technology from infringement," said John Heaton, President and CEO of Nanometrics.
The complaint filed relates to U.S. Patent Numbers 5,867,276, entitled "Method for Broad Wavelength Scatterometry," and 7,115,858 B1, entitled "Apparatus and Method for the Measurement of Diffracting Structures." This filing follows the March 30, 2006 announcement of the complaint filed against Nova Measuring Instruments Ltd. in the United States District Court for the Northern District of California for infringing Nanometrics' U.S. Patent Number Re. 34,783. The patent, "Method for Determining Absolute Reflectance of a Material in the Ultraviolet Range," relates to Nanometrics' ultraviolet reflectometry and optical critical dimension tools.
