News Article
Nanometrics and ASML enter into cross-Licensing agreement
Nanometrics Incorporated announced it has entered into a cross-licensing agreement with ASML
"We are committed to offering our customers extendible, open-architecture Overlay and CD control solutions that scale beyond 32nm," commented John Heaton, President and CEO of Nanometrics. "We are extremely pleased to be working with ASML to create solutions that improve lithography performance and economics.""Metrology within the scanner is a key element for the current performance of ASML lithography systems. With increased access to advanced metrology technology we see further opportunities for advancements in lithography and wafer patterning," stated Karel van der Mast, senior vice president of ASML.
