Rohm and Haas Electronics plans $30 million R&D expansion at Chonan, Korea
Rohm and Haas Electronic Materials, Microelectronic Technologies announced the completion of a $30 million expansion in their Chonan, Korea facility. This investment enables advanced research and development activities in 193 nm photoresists, organic anti-reflectants and silicon hardmask technologies at the Chonan site.
"Local manufacturing of the most advanced products in our state-of-the art facility in Chonan combined with a highly talented resident R&D team will keep us ahead of the rapidly expanding semiconductor materials needs in this region," said Dr. Yi Hyon Paik, president of Microelectronic Technologies for Rohm and Haas Electronic Materials.
The Chonan plant now includes advanced 193 nm and 248 nm lithographic clusters along with defect and metrology tool sets. New R&D and engineering resources are in place now, with more growth planned throughout 2007 as the research programs accelerate.
"We have made significant investments and will continue to strengthen the Chonan site over the next few years," stated Dr. Hoe-Sik Chung, president of Microelectronic Technologies for Rohm and Haas Electronic Materials Korea.
"We can now provide our nearby semiconductor customers with locally manufactured, high technology imaging products coupled with immediate on-site technical support," Chung said.
