PDF Solutions and Fabbrix collaborate on IP Infrastructure at sub-65 Nanometres
PDF Solutions, Inc announced a plan to collaborate with Fabbrix. The collaboration will address the yield challenges inherent in sub-65 nanometre (nm) processes. Fabbrix has developed a proprietary solution for overcoming the shortfalls of restricted design rules necessary to achieve high yields without sacrificing area utilization at advanced nodes. The Fabbrix solution is based on implementing RTL with a limited set of bricks built out of regular design patterns. These design patterns, known as design fabrics, must be created and optimized to achieve maximum manufacturability.
"Arming semiconductor firms with the tools they need to achieve superior yields is the top priority for PDF," said Dr. John Kibarian, Chief Executive Officer of PDF Solutions. "By coupling PDF Solutions' experience and expertise in silicon characterization and yield modelling with best-in-class design solutions from technology leaders such as Fabbrix, we continue to position PDF to be able to improve clients' product yields in a manner that cannot be achieved through process improvements alone."
"Collaborating with PDF Solutions will enable Fabbrix to approach customers with a solution for silicon optimized design flows at advanced process nodes," said Dr. Larry Pileggi, Chief Technology Officer and Co-Founder of Fabbrix. "PDF Solutions has demonstrated the ability to achieve rapid and significant results for identifying and correcting sources of yield loss within our targeted customer base. With a joint development project for us to leverage PDF Solutions' technical infrastructure, Fabbrix will be positioned to deliver on the promise of yield optimized chips while achieving the full area reduction potential of advanced process nodes necessary to justify the costs of migrating beyond 65 nanometre processes."
