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News Article

Amidst semiconductor meterology segment reshuffle, Tevet creates niche

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With record 2006 sales and a continuing momentum of design wins in January, Tevet Process Control Technologies has established its presence within the highly competitive semiconductor metrology market.

With record 2006 sales and a continuing momentum of design wins in January, Tevet Process Control Technologies has established its presence within the highly competitive semiconductor metrology market. During a year marked by intensive metrology mergers, technology rationalizations, and product line cancellations, Tevet won validation of its Integrated Metrology Module (IMM) by delivering high throughput with low capital and running costs to develop an entirely new parallel sensor metrology niche.

In the past, integrating metrology on process tools and in fab automation equipment was largely impractical because of the high cost, low reliability, and low throughput of available integrated metrology solutions. In 2005, with the market introduction of the Trajectory T3 film thickness integrated metrology module (IMM), Tevet inaugurated a new segment within the fast growing semiconductor process control and metrology sector. Tevet secured key design-win milestones that mark its emergence in semiconductor integrated metrology.

In January 2007, Tevet gained records in the number of integrations, IMM adoption per tool, IMM adoption per fab site, and IMM tool-of-record selection. Other milestones reached include: · 10 design-in wins with leading IC process equipment manufacturers and Fab automation systems· 3 new tool-of-record selections at multi-site, multinational IC manufacturers in Q4 2006· 4X growth in Tevet CVD IM installed base, 2005 to 2006· Record backlog: exited 2006 with approximately 30% of 2007 projected revenue already booked

"The strong growth at Tevet over the last two years validated the need for Tevet's parallel sensor, in-die measurement approach," said Yuval Wasserman, CEO of Tevet Process Control Technologies. "Tevet's Trajectory T3 has been instrumental in monitoring and controlling production-cost sensitive process steps in leading IC fabs with unmatched ROI. As 2007 begins, we see fabs aggressively running higher throughput tools and processes that, in turn, require Tevet's integrated metrology to keep up with their fastest processes while providing every-wafer measurement and detection. We are pleased with the customer response as made evident by our recent milestones and expect our growth rate to continue at above the triple digit percentage growth we've seen since Tevet's introduction of the parallel sensor IMM process control solution."

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