Freescale selects Cabot Microelectronics’ CMP polishing pad
Cabot Microelectronics Corporation has announced that Freescale Semiconductor has selected the Epic D100 CMP polishing pad for use in its manufacturing process.Cabot Microelectronics and Freescale collaborated on the qualification, adoption and product ramp up for the Epic D100 pad technology.
After an extensive evaluation that included on site trials and quality audits of Cabot Microelectronics' manufacturing processes and facilities, Freescale has selected the Epic D100 pad for various manufacturing processes at its wafer fabrication factories. Since its adoption six months ago, the Epic D100 pad has been running successfully in production.
"We worked extensively with Cabot Microelectronics to ensure the successful adoption of the Epic D100 CMP polishing pad and are pleased with the results we see in our manufacturing process," said Grant McEwan, CMP Process Engineering Section Manager, for Freescale's Austin Technology and Manufacturing Centre. "The Epic D100 has proven to be cost-effective and durable. We intend to use it for multiple applications."
Dinesh Khanna, Cabot Microelectronic's Global Pads Business Director stated, "Customer collaboration is critical to our development and commercialisation process. We are pleased that Freescale elected to partner with us and ultimately chose the Epic D100 for its CMP manufacturing process."
