Cymer to ship First XLR 500i laser light source to Nikon
Cymer, Inc. has announced it has reached an agreement to ship its first revolutionary XLR 500i light source, to lithography system provider--Nikon Corporation. The XLR 500i is a first in argon fluoride (ArF) laser light source for 45nm production immersion photolithography.
"Last quarter, we celebrated our longstanding partnership with Cymer on the occasion of their 1,000th excimer laser shipment," said Mr. Kazuo Ushida, president of the Nikon Precision Equipment Company, Nikon Corporation. "Nikon is pleased to be the first recipient of the XLR 500i light source. We look forward to integrating this laser into our NSR-S610C immersion tool."
"This milestone shipment illustrates Cymer's continued commitment to push the limits of DUV lithography in order to advance the production of chips that power the electronic devices we rely on each day," said Ed Brown, Cymer's president and chief operating officer. "As immersion lithography is deployed into 45nm full production environments, we look forward to providing our customers with laser light sources that enable improved critical dimension control and manageable operating costs."
More than 360 XL Series systems have been shipped to date. The XLR 500i leverages Cymer's past research and development efforts advancing the production of chips that power everyday electronic devices.
