Nikon ships first 45 nm production immersion scanner
Nikon Corporation has shipped its first immersion lithography system capable of 45 nm production. The NSR-S610C, an ArF immersion scanner with a projection lens NA of 1.30, shipped to a major IC manufacturer. The system is targeted for mass production of 45 nm devices and can also be used for development of 32 nm devices and double patterning. The NSR-S610C was selected because of its early market introduction and ability to print immersion exposures with no immersion-induced defects and overlay equivalent or better than dry systems.
"2006 was a great year for Nikon's immersion program," said Kazuo Ushida, President of the Nikon Precision Equipment Company. "In January, we shipped our first production immersion system, the NSR-S609B. Throughout the year, we achieved wins at several accounts by demonstrating our immersion technology. And, after a one-year, head-to-head evaluation in a customer fab, we secured the immersion business at a major IC manufacturer. The shipment of the NSR-S610C confirms our position in immersion technology."
