SEMATECH choose Bede X-ray metrology system for 45nm materials
Bede X-ray Metrology is pleased to announce that SEMATECH, will use a Bede X-ray metrology system to evaluate novel semiconductor materials needed for the 45 and 32nm technology nodes and beyond. The Bede X-ray metrology system will be used by SEMATECH researchers to investigate front end materials including SiGe, metal gates and high-k dielectrics. More specifically, the system will assist metrologists in investigations into the phase and degree of crystallinity present in high-k dielectrics and metal electrodes, and the determination of the strain in SiGe films.
"Our evidence shows that the phase and crystallinity in high-k material have an impact on a device's electrical characteristics," said Dr. Alain Diebold, SEMATECH Senior Fellow and metrology expert. "Using XRD allows us to fine-tune the process, and speed up high-k development. Currently, XRD is a leading technique for measuring strain and composition in SiGe."
Frank Hochstenbach, Director of Sales and Marketing, of Bede X-ray Metrology said, "I am delighted that SEMATECH is using our system to help to deliver new solutions and value to its customers and to the industry."
