Electron beam-based mask repair system for 45nm node launched
Carl Zeiss SMT has launched its new generation of e-beam mask repair systems, the MeRiT MG 45. Carl Zeiss SMT provides the mask repair system matching the advanced requirements for the 45nm design node.
Dr. Oliver Kienzle, Member of the Board of the Semiconductor Metrology Systems (SMS) division, points out: "We have already built up an order backlog of more than five systems, clearly underlining the technological position of our e-beam repair technology for the 45nm design node and beyond.
The tool covers opaque and clear defect repair on both PSM and binary masks in one platform. It enables the repair of phase- shifting masks with tunable phase and transmission matching.
"Together with the AIMS 45-193i, we are now able to offer our customers a comprehensive solution for mask qualification and repair at the 45nm node. With this complete combination of tools we support mask shops in their aim to deliver defect-free photomasks for optimum yield in semiconductor production." states Kienzle, pointing out potential synergies for users.
In the fall of 2006, Carl Zeiss SMT introduced the new AIMS 45 - 193i mask qualification system with great success. This system can emulate the conditions of immersion lithography which becomes a critical success factor in the fabrication of the most powerful chips.
